Features

Primary Ion Beam

• Independent control of primary and extracted beam energies and polarities.
• 45 degree angle primary beam incident angle for efficient Sputtering of sample.
• Hollow cathode duoplasmatron ion source designed at Cambridge University (UK) especially for ion probe applications - dual polarity - exceptionally bright and stable.
• Option of Cesium gun for analysis of oxygen and electron gun for source neutralisation.
• Wien filter for mass filtering of primary ion beam - adjustable resolution - may be turned off to maximize sputtering rates.
• Kohler focussing provides radially ion flux on the primary beam.
• Beam diameter variable from 5µm to 30µm.
• Beam diameter and brightness adjusted independently.
• Sharply defined, flat-bottomed pits.

Sample Stage

• Standard 25mm diameter sample mounts - Thin section holder or large diameter mega-mount options.
• Fully automated sample transfer.
• Total computer control of sample stage movements - Multiple sample coordinates can be stored and revisited.
• Visual optics permit viewing of sample stage during analysis - Variable magnification - Colour CCD camera/video monitor.
• Up to three samples at one time can be stored in the vacuum lock In addition, two more samples can be placed in the specimen chamber, allowing for the easy comparison of a standard with an unknown.

Seconday Ion Beam

• 90 degree angle extraction of the secondary beam to minimise instrumental discrimination.
• Large apeture eliminates sample-to-sample memory Low field gradient extraction minimizes inter-element discrimination.
• Triple quadrupole lens matching of secondary beam for maximum transmission.
• Simultaneous collection of secondary and mass analysed beams for maximum precision of analysis.
• Large (1272 mm) radius electrostatic analyser.
• Rotatable source slit, width continuously variable from 5µm to 150µm.
• Isotopic mapping of samples accomplished by rastering sample beneath primary beam.
• Elegant, simple integrated ion lens system minimizes beam abberations and simplifies operation.
• High mass dispersion achieved with large (1000mm) radius sector electromagnet.
• Very stable, high speed laminated electromagnet controlled by multiple Hall Effect probes
• Resolution > 5000 (1% definition) with flat-tops for 80µm source slit and 100µm collector slit.
• Sensitivity better than 18cps/ppm/²⁰⁶Pb/nA 0₂^- under above conditions

Single Collector

• Rotatable collector slit, width continuously variable from ~5µm to 300µm.
• Ion counting with robust, high gain, high speed electron multiplier, or
• Ion current measurement via Faraday cup and electrometer.
• Advanced, low-noise electrometers, with computer-configurable gain and settling time.

Multi-Collector (option)

• Five channels of Faraday cups or electron multipliers.
• Fully reconfigurable under vacuum; no lost time in re-pumping.
• Most variables adjustable under computer control (slit size, head spacing, focus).

Instrument Control

• PC platform standard.
• Entire vacuum system under microprocessor control.
• Highly intuitive, easy-to-use graphically orientated operation of entire machine.
• Remote operation via the web, allowing monitoring or real-time control.
• Optional Automated operation for unattended operation and sample pre-screening.