SHRIMP II Features

 Primary Ion Beam

  • Independent control of primary and extracted beam energies and polarities.
  • 45 degree angle primary beam incident angle for efficient Sputtering of sample.
  • Hollow cathode duoplasmatron ion source designed at Cambridge University (UK) especially for ion probe applications - dual polarity - exceptionally bright and stable.
  • Option of Cesium gun for analysis of oxygen and electron gun for source neutralisation.
  • Wien filter for mass filtering of primary ion beam - adjustable resolution - may be turned off to maximize sputtering rates.
  • Kohler focussing provides radially ion flux on the primary beam.
  • Beam diameter variable from 5µm to 30µm.
  • Beam diameter and brightness adjusted independently.
  • Sharply defined, flat-bottomed pits.


Sample Stage

  • Standard 25mm diameter sample mounts - Thin section holder or large diameter mega-mount options.
  • Fully automated sample transfer.
  • Total computer control of sample stage movements - Multiple sample coordinates can be stored and revisited.
  • Visual optics permit viewing of sample stage during analysis - Variable magnification - Colour CCD camera/video monitor.
  • Up to three samples at one time can be stored in the vacuum lock In addition, two more samples can be placed in the specimen chamber, allowing for the easy comparison of a standard with an unknown.


Seconday Ion Beam

  • 90 degree angle extraction of the secondary beam to minimise instrumental discrimination.
  • Large aperture eliminates sample-to-sample memory Low field gradient extraction minimizes inter-element discrimination.
  • Triple quadrupole lens matching of secondary beam for maximum transmission.
  • Simultaneous collection of secondary and mass analysed beams for maximum precision of analysis.
  • Large (1272 mm) radius electrostatic analyser.
  • Rotatable source slit, width continuously variable from 5µm to 150µm.
  • Isotopic mapping of samples accomplished by rastering sample beneath primary beam.
  • Elegant, simple integrated ion lens system minimizes beam abberations and simplifies operation.
  • High mass dispersion achieved with large (1000mm) radius sector electromagnet.
  • Very stable, high speed laminated electromagnet controlled by multiple Hall Effect probes
  • Resolution > 5000 (1% definition) with flat-tops for 80µm source slit and 100µm collector slit.
  • Sensitivity better than 18cps/ppm/206Pb/nA 02- under above conditions

Single Collector

  • Rotatable collector slit, width continuously variable from ~5µm to 300µm.
  • Ion counting with robust, high gain, high speed electron multiplier, or
  • Ion current measurement via Faraday cup and electrometer.
  • Advanced, low-noise electrometers, with computer-configurable gain and settling time.

Multi-Collector (option)

  • Five channels of Faraday cups or electron multipliers.
  • Fully reconfigurable under vacuum; no lost time in re-pumping.
  • Most variables adjustable under computer control (slit size, head spacing, focus).

Instrument Control

  • PC platform standard.
  • Entire vacuum system under microprocessor control.
  • Highly intuitive, easy-to-use graphically orientated operation of entire machine.
  • Remote operation via the web, allowing monitoring or real-time control.
  • Optional Automated operation for unattended operation and sample pre-screening.